FacultyFaculty/Author Profile

Thomas F. Presson

Frommer Lawrence & Haug LLP

New York City, NY, USA


Thomas F. Presson is a partner in the New York office of Frommer Lawrence & Haug LLP.

Mr. Presson specializes in patent prosecution, including preparation and prosecution of patent applications, and reissue proceedings, in a wide range of technologies including electronics, integrated circuit design, and data processing systems. He also renders freedom-to-operate opinions and non-infringement opinions. Mr. Presson's practice also includes due diligence investigations and valuation of intellectual property assets.

Mr. Presson has a bachelor's degree in electrical engineering from Vanderbilt University. He received his law degree from Quinnipiac University and an LL.M., in intellectual property, from George Washington University. Mr. Presson is a member of the bars of New York, Connecticut, and D.C. and is registered to practice before the U.S. Patent and Trademark Office.

EDUCATION

  • VANDERBILT University, (B.E., 1989)
  • Quinnipiac University School of Law, (J.D., 1994)
  • George Washington University, (LL.M., 1997)


BAR ADMISSIONS

  • CONNECTICUT, 1995
  • District of Columbia, 1997
  • New York, 1999
  • Registered to practice before U.S. Patent and Trademark Office
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