Thomas F. Presson is a partner in the New York office of Frommer Lawrence & Haug LLP.
Mr. Presson specializes in patent prosecution, including preparation and prosecution of patent applications, and reissue proceedings, in a wide range of technologies including electronics, integrated circuit design, and data processing systems. He also renders freedom-to-operate opinions and non-infringement opinions. Mr. Presson's practice also includes due diligence investigations and valuation of intellectual property assets.
Mr. Presson has a bachelor's degree in electrical engineering from Vanderbilt University. He received his law degree from Quinnipiac University and an LL.M., in intellectual property, from George Washington University. Mr. Presson is a member of the bars of New York, Connecticut, and D.C. and is registered to practice before the U.S. Patent and Trademark Office.
- VANDERBILT University, (B.E., 1989)
- Quinnipiac University School of Law, (J.D., 1994)
- George Washington University, (LL.M., 1997)
- CONNECTICUT, 1995
- District of Columbia, 1997
- New York, 1999
- Registered to practice before U.S. Patent and Trademark Office